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Address: Via Barbara Melzi 170, 20025 Legnano
Advanced Surface Treatments
Our expertise encompasses advanced technologies for the surface preparation and modification of metals and alloys. We can support you by evaluating the feasibility of various approaches and arranging the necessary tests. We are official partner of PLASMIONIQUE and can support you in obtaining the right solution for your needs. Send us your inquiry, and we will respond within a short time.
Surface Modification Technologies
In the following is a list of advanced surface modification technology that find application in industry and accademia. Do not hesitat to contact us if you are interested to acquire or to gather further information about the presented instruments.
EVAD Series - Thermal Evaporation Systems
Controlled evaporation of metals, dielectrics and organic materials using E-beam, or various Resistive Heating technics are implemented. Low temperature Effusion cells with PID temperature control are used for deposition of organic molecules. Special features, such as electron impact ionization of organic and inorganic vapor, substrate heating or cooling and biasing are options available. All systems, large, compact or table-top include data acquisition and real time monitoring of process parameters and allow thickness control with high precision.
The FLARION series plasma reactors are offered in various configuration for PECVD, RIE, DRIE and PE applications. The FLARION series plasma reactors could be offered with RF (ICP and CCP), Microwave Plasma or in Hybrid configuration, offering significant flexibility for independent control of ion density and their energies. The turn-key system offers full process automation, and data logging. Option to integrate plasma spectroscopy for process control or monitoring is also available.
MAGNION, FLARION and EVAD series in Compact or Table-topsize significantly minimize the cost of R&D. Process recipes could be developed and the integrated data acquisition system displays and logs the data in real time. Single or multi-source Magnetron Sputtering or Thermal Deposition with boats, baskets and Mini K-Cells for organic and inorganic materials. Hybrid configurations are also offered. Gas management with upstream PID pressure control is standard. The option for integration in an environment controlled glovebox is also available.
The MAGNION Series sputter deposition systems are highly versatile Turn-Key systems with fully integrated control and data acquisition. Upgrade to Plasma assisted Reactive Deposition using PLUME series ICP sources is seamless. Substrate rotation, biasing, computer controlled axial motions are options available on all systems. All systems are customized and option for integration of various diagnostics is available.
PLUME Series ICP, Neutral Atom and Ion sources are highly versatile and could be adapted to variety of applications. They are used as remote plasma sources or immersed plasma source for powder or in-line surface treatment. With inclusion of a beam extraction module, high current densities up to 6 mA/cm2 could be achieved. Among variety of applications are plasma surface cleaning, surface functionalization, ion assisted deposition, plasma assisted ALD, PECVD, IBAD. The customized design of the source enclosure facilitates its integration into any existing system.
The versatile ATMOS-R2R systems allow surface deposition on flexible webs of various types of materials. Various deposition or treatment sources could be integrated within the same process chamber. The FLOCON series gas, vapour and liquid flow management systems integrated in the system offer unparalleled flexibility. The PLASMICON control system allows full process automation and it includes data acquisition system. The Users could save and recall data and process recipes.
FLOTEST stations are custom designed for development of sensors for gases, and chemicals in vapour or liquid phase. The capability of fast modulation of flow allows measuring the response time of the sensors. Various functionalities integrated FLOTEST offers significant flexibility for sensor developers. The data from all operation parameters and signals from the sensors are monitored graphically in real time and saved with time stamped allowing their integration with other diagnostics. All test steps could be programmed, saved and recalled.
PLASMIONIQUE’s PUPION series, Plasma-Based Ion Implanters, are economical and versatile tools for shallow Advanced surface engineering applications and depth doping, including implantation of β-emitting medical grade radioisotopes with significantly lower contamination issues. Variety of plasma excitation techniques could be offered, depending on required application. The PUPION systems are fully computer controlled and have integrated data acquisition system for real time process parameter monitoring and data logging.
The FLARION series Microwave plasma reactors are designed for variety of applications. The synthesis of Single Crystalline Diamond (SCD), or Poly–Crystalline Diamond (PSD) requires a single mode excitation design. A multimode excitation design offers a general purpose plasma reactor for PECVD, Etching or surface cleaning. An electron cyclotron resonance (ECR) plasma, in combination with a magnetic field, is an ideal low pressure plasma reactor. Plasmionique also offers various plasma sources, including surfatrons, downstream plasma, and ECR plasma .
PLASMIONIQUE offers custom designed CVD, MOCVD, and ALD systems W/WO plasma for R&D and small batch productions. The customized reactors include FLOCON series liquid, vapor and gas flow management systems. Various types of Plasma sources, including remote or volume ICP and variety of microwave plasma sources could also be integrated in these systems. Full computer controlled operation with a data acquisition system for process parameters and diagnostics is a standard feature.
GLAZE series Pulsed Laser Deposition Systems are custom designed for Advanced Thin Film Coating applications. Various options, including Reactive Deposition, as well as integration of magnetron cathodes, which combined with our patented hybrid process could significantly improve the quality and the deposition efficiency of the coatings. The control system allows full process automation, and the data acquisition system displays the process parameter in real time and saves for recall. Option for insitu-diagnostics is also available.
Horizontal Tube Furnaces are highly versatile units allowing synthesis and deposition of various types of materials from gaseous, vapour, liquid and solid sources, for both R&D and Industrial applications. Single and multi zone furnaces combined with FLOCON series gas, vapour and liquid flow management systems offer unparalleled flexibility. Systems with rotary motion, for high temperature CVD/PECVD treatment of powders is also available. The PLASMICON control system allows full automation and includes data acquisition system, allowing to save and recall data and process recipes.